A second commercial high numerical aperture (High NA) extreme ultraviolet (EUV) lithography scanner purchase is likely coming, which will be one of many such tools going to semiconductor manufacturers soon, according to market research firm TrendForce.
Intel was the first company to purchase ASML’s High-NA EUV lithography equipment and installed the device last month in its Hillsboro, Oregon, manufacturing facility. The device is now in the optical system calibration phase.
While Intel grabbed the lead in this regard, it will likely be short lived with the rumor of a second such tool already purchased and delivered to a buyer that was not revealed.
TrendForce also said Taiwan Semiconductor Manufacturing Co. (TSMC), Samsung and Micron have all placed orders for High NA lithography machines from ASML. This will not just give a boon to ASML as these machines are valued at up to $373 million but will aid these foundries and chipmakers in developing advanced process chips.
While two of these machines won’t meet the overall demand in the market, ASML plans to manufacture more tools in the future, TrendForce said.
Additionally, Samsung is in talks with Germany equipment vendor Zeiss to collaborate on next-generation semiconductor technology including EUV technology to improve the yield of advanced chips. Zeiss plans to invest $34.6 million in the next two years to establish an R&D center in South Korea to strengthen the cooperation in the region, including its collaboration with Samsung.
