Research house Imec and semiconductor manufacturing equipment maker ASML Holding N.V. have started the next phase of its high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography pilot line.
The goal of the pilot line is intended to help semiconductor makers understand opportunities in chip technology as well as access to the prototyping platform. Specifically, the collaboration will focus on the development of:
- Sustainable manufacturing
- Advanced holistic patterning flows
Under the deal, ASML’s full suite of lithography and metrology equipment will join the Imec pilot line in Leuven, Belgium. This will include its latest deep EUV tools, Yieldstar optical metrology and HMI multi-beam tools.
High-NA technology is used for the development of high-performance energy-efficient semiconductors such as artificial intelligence systems. The technology enables solutions for healthcare, nutrition, mobility, automotive, climate change and sustainable energy markets.
ASML said these types of investments are needed to secure access to High-NA EUV lithography beyond 2025 and retain the related advanced node process R&D capabilities.
As part of the agreement, Imec and ASML will collaborate with other chipmakers and equipment ecosystem partners with the goal of preparing the technology for the adoption in mass manufacturing. These activities will ramp up at the Imec pilot line in Leuven, Belgium.