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Leti & Mapper to Present Three Papers on Massively Parallel Electron-beam Litho at SPIE Advanced Lithography 2018

21 February 2018

Mapper and Leti will give three presentations on massively parallel electron-beam lithography at SPIE Advanced Lithography 2018, Feb. 25-March 1, in the San Jose Convention Center. In addition, Leti will host a workshop on "Alternative Lithography" on March 1 with Mapper, ARKEMA and EVG. For more information on the workshop, click here.

In addition to their invited paper, "Performance validation of Mapper's FLX-1200" at 4:20-5 p.m., on Feb. 27 in Room 211, other Mapper and Leti presentations include:

  • “Overlay and stitching metrology for massively parallel electron-beam lithography,” 4:40-5 p.m., Feb. 27, Room 220B, and
  • “Process development for the maskless N40 via layer for security applications,” 11:10-11:30 a.m., March 1, Room 210B.

Leti will present 15 papers in total during the five-day conference.

To contact the author of this article, email sue.himmelstein@ieeeglobalspec.com


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Date Event Location
11-13 Sep 2018 Novi, Michigan
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