Metrology solution improves semiconductor fab process control

Picarro Inc., a provider of chemical metrology systems for advanced semiconductor fabs, has unveiled its SLiM 100 Lithography Process Tool Monitoring System. The new 1 ppb class chemical metrology solution detects volatile organic compounds (VOCs) in the lithography process in real time, enabling semiconductor manufacturers to quickly take steps to prevent excursions and detect non-visual defects, thereby improving yield.

As design features shrink, small amounts of airborne molecular contamination (AMC) from VOCs are resulting in significant increases in non-visual defects on reticles and wafers. Crystal growth defects on reticles, hazing of scanner optics, and t-topping of photoresists are some of the serious problems that are caused by the presence of undesired VOCs. Ultimately, these contaminants not only damage expensive lithography tools — they result in yield loss on the wafer.

Source: Picarro Inc.

The SLiM 100 system delivers real-time measurement in a device designed to run 24/7 in the fab environment. It is a fully integrated chemical metrology system that is robust, easy to operate, and is ideal for high-volume process monitoring and control. It measures and monitors 10 organic compounds that negatively affect the lithography process with concentration sensitivity down to 1 ppb and can also accommodate analyzers that measure inorganic molecules at ppt concentration levels.