Industrial Electronics

TopWave 229: Industrial continuous-wave laser for deep UV Raman

22 June 2022

TOPTICA presents the new TopWave 229, the latest addition to its industrial deep ultraviolet (UV) laser lineup at Analytica held June 21 through June 24 in Munich, Germany. The TopWave 229 offers a new choice for deep UV spectroscopists looking for an easy to deploy and reliable laser that enables the user to focus on their application rather than worrying about the light source.

With its state-of-the-art laser controller, the TopWave 229 features a wide range of options for operation. While laboratory users might prefer the controller's easy to use touchscreen interface or the TOPAS PC GUI, system integrators will appreciate the comprehensive command language that enables smooth integration with their control software. A short wavelength and an ultra-narrow laser linewidth (< 1 MHz ≙ < 4 x 10-5Source: TOPTICASource: TOPTICA cm-1) position the TopWave 229 to assume an important role as an excitation source in the field of deep UV Raman and deep UV fluorescence spectroscopy.

Excitation below 250 nm is crucial for fluorescence-free Raman, as this avoids the overlap between the spectral regions of the Raman signal and the native fluorescence. Compared to fluorescence, the Raman effect is orders of magnitude weaker, so that even minimal fluorescence is sufficient to mask Raman emission. Fluorescence spectroscopy also benefits from the 228.5 nm emission, because it allows the detection of molecules with fluorescence spectra in the range ≤ 270 nm, which can only be excited with shorter wavelength light. As a continuous-wave laser system, the TopWave 229 offers another advantage: it avoids non-linear and saturation problems common with pulsed laser sources.

The compact footprint and low heat dissipation of the TopWave 229 laser head allow for easy integration in space restricted and temperature sensitive application environments. Comfortable, hands-off operation over the system lifetime (typically 10,000 hours) is ensured by fully automated optimization routines for the internal opto-mechanics. To provide best reliability and consistent, diffraction limited beam quality (M² < 1.3), the complete UV beam path is enclosed in a specially sealed compartment.

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